화학공학소재연구정보센터
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No. Article
1 Formation and optical properties of Ge films grown on Si(111) substrates using nanocontact epitaxy
Tanaka K, Nakamura Y, Yamasaka S, Kikkawa J, Sakai T, Sakai A
Applied Surface Science, 325, 170, 2015
2 Heteroepitaxial growth of Ge on compliant strained nano-structured Si lines and dots on (001) silicon on insulator substrate
Zaumseil P, Yamamoto Y, Schubert MA, Schroeder T, Tillack B
Thin Solid Films, 557, 50, 2014
3 Preparation and characterization of Ge epitaxially grown on nano-structured periodic Si pillars and bars on Si(001) substrate
Zaumseil P, Yamamoto Y, Bauer J, Schubert MA, Matejova J, Kozlowski G, Schroeder T, Tillack B
Thin Solid Films, 520(8), 3240, 2012
4 B atomic layer doping of Ge
Yamamoto Y, Kopke K, Kurps R, Murota J, Tillack B
Thin Solid Films, 518, S44, 2010
5 Fabrication of high quality Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches
Wang G, Loo R, Takeuchi S, Souriau L, Lin JC, Moussa A, Bender H, De Jaeger B, Ong P, Lee W, Meuris M, Caymax M, Vandervorst W, Blanpain B, Heyns MM
Thin Solid Films, 518(9), 2538, 2010
6 Study of the surface cleaning of GOI and SGOI substrates for Ge epitaxial growth
Moriyama Y, Hirashita N, Usuda K, Nakaharai S, Sugiyama N, Toyoda E, Takagi S
Applied Surface Science, 256(3), 823, 2009
7 GaAs on Ge for CMOS
Brammertz G, Caymax M, Meuris M, Heyns M, Mols Y, Degroote S, Leys M
Thin Solid Films, 517(1), 148, 2008
8 Islands as catalyst for film relaxation in Bi-mediated Ge epitaxy on Si(111)
Falta J, Schmidt T, Materlik G, Zeysing J, Falkenberg G, Johnson RL
Applied Surface Science, 162, 256, 2000