화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Investigation of gate length and fringing field effects for program and erase efficiency in gate-all-around SONOS memory cells
Kim MS, Choi SJ, Moon DI, Duarte JP, Kim S, Choi YK
Solid-State Electronics, 79, 7, 2013
2 Scalability of the drain-current drive of AlGaN/GaN HFETs with gate-length
Sikder MJ, Valizadeh P
Solid-State Electronics, 89, 105, 2013
3 Parasitic capacitance removal of sub-100 nm p-MOSFETs using capacitance-voltage measurements
Steinke DR, Piccirillo J, Gausepohl SC, Vivekand S, Rodgers MP, Lee JU
Solid-State Electronics, 68, 51, 2012
4 Effect of gate length in InAs/AlSb HEMTs biased for low power or high gain
Borg M, Lefebvre E, Malmkvist M, Desplanque L, Wallart X, Roelens Y, Dambrine G, Cappy A, Bollaert S, Grahn J
Solid-State Electronics, 52(5), 775, 2008
5 Sidewall transfer lithography for reliable fabrication of nanowires and deca-nanometer MOSFETs
Hallstedt J, Hellstrom PE, Radamson HH
Thin Solid Films, 517(1), 117, 2008
6 50 nm metamorphic GaAs and InPHEMTs
Thayne I, Elgaid K, Moran D, Cao X, Boyd E, McLelland H, Holland M, Thoms S, Stanley C
Thin Solid Films, 515(10), 4373, 2007
7 Electrical characterization of 12 nm EJ-MOSFETs on SOI substrates
Henschel W, Wahlbrink T, Georgiev YM, Lemme M, Mollenhauer T, Vratzov B, Fuchs A, Kurz H, Kittler M, Schwierz F
Solid-State Electronics, 48(5), 739, 2004