화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Effects of Anneal and Silicon Interface Passivation Layer Thickness on Device Characteristics of In0.53Ga0.47As Metal-Oxide-Semiconductor Field-Effect Transistors
Zhu F, Zhao H, Ok I, Kim HS, Yum J, Lee JC, Goel N, Tsai W, Gaspe CK, Santos MB
Electrochemical and Solid State Letters, 12(4), H131, 2009
2 InSb quantum-well structures for electronic device applications
Edirisooriya M, Mishima TD, Gaspe CK, Bottoms K, Hauenstein RJ, Santos MB
Journal of Crystal Growth, 311(7), 1972, 2009