화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Self-terminated etching of GaN with a high selectivity over AlGaN under inductively coupled Cl-2/N-2/O-2 plasma with a low-energy ion bombardment
Zhong YZ, Yu Z, Gao HW, Dai SJ, He JL, Feng MX, Qian S, Zhang JJ, Zhao YF, An DS, Hui Y
Applied Surface Science, 420, 817, 2017
2 Effect of profile and size of isolation trench on the optical and electrical performance of GaN-based high-voltage LEDs
Zhou SJ, Zheng CJ, Lv JJ, Liu YC, Yuan S, Liu S, Ding H
Applied Surface Science, 366, 299, 2016
3 Analysis of GaN etching damage by capacitively coupled RF Ar plasma exposure
Kawakami R, Inaoka T, Minamoto S, Kikuhara Y
Thin Solid Films, 516(11), 3478, 2008