검색결과 : 22건
| No. | Article |
|---|---|
| 1 |
Spectroscopic imaging ellipsometry of self-assembled SiGe/Si nanostructures. Alonso MI, Funke S, Gonzalez A, Garriga M, Vaccaro PO, Goni AR, Ruiz A, Alonso M, Thiesen PH Applied Surface Science, 421, 547, 2017 |
| 2 |
Impact of thickness on the structural properties of high tin content GeSn layers Aubin J, Hartmann JM, Gassenq A, Milord L, Pauc N, Reboud V, Calvo V Journal of Crystal Growth, 473, 20, 2017 |
| 3 |
Comparative analysis of thermally induced degradation of condensation-grown (100)Ge0.75Si0.25/SiO2 interfaces by electron spin resonance Kepa J, Stesmans A, Afanas'ev VV Applied Surface Science, 291, 20, 2014 |
| 4 |
Quantification of strain through linear dichroism in the Si 1s edge X-ray absorption spectra of strained Si1-xGex thin films Cao W, Masnadi M, Eger S, Martinson M, Xiao QF, Hu YF, Baribeau JM, Woicik JC, Hitchcock AP, Urquhart SG Applied Surface Science, 265, 358, 2013 |
| 5 |
Solid solubility of germanium in silver Kazemi H, Weber L Thermochimica Acta, 544, 57, 2012 |
| 6 |
Growth of homogeneous polycrystalline Si1-xGex and Mg2Si1-xGex for thermoelectric application Hayakawa Y, Arivanandhan M, Saito Y, Koyama T, Momose Y, Ikeda H, Tanaka A, Wen CL, Kubota Y, Nakamura T, Bhattacharya S, Aswal DK, Babu SM, Inatomi Y, Tatsuoka H Thin Solid Films, 519(24), 8532, 2011 |
| 7 |
High Quality Single-Crystal Laterally Graded SiGe on Insulator by Rapid Melt Growth Koh HYS, Chen SL, Griffin PB, Plummer JD Electrochemical and Solid State Letters, 13(8), H281, 2010 |
| 8 |
Texture of Cobalt Germanides on Ge(100) and Ge(111) and Its Influence on the Formation Temperature De Keyser K, Van Meirhaeghe RL, Detavernier C, Jordan-Sweet J, Lavoie C Journal of the Electrochemical Society, 157(4), H395, 2010 |
| 9 |
Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe : H Doyle JR, Xu Y, Reedy R, Branz HM, Mahan AH Thin Solid Films, 516(5), 526, 2008 |
| 10 |
Defect analysis of thin film Si-based alloys deposited by hot-wire CVD using junction capacitance methods Cohen JD, Datta S, Palinginis K, Mahan AH, Iwaniczko E, Xu YQ, Branz HM Thin Solid Films, 516(5), 663, 2008 |