검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Process damage assessment of a low energy inductively coupled plasma-based neutral source Tang XM, Wang Q, Manos DM Journal of Vacuum Science & Technology B, 18(3), 1262, 2000 |
| 2 |
Evaluation and Control of Device Damage in High-Density Plasma-Etching Gadgil PK, Mantei TD, Mu XC Journal of Vacuum Science & Technology B, 12(1), 102, 1994 |