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| No. | Article |
|---|---|
| 1 |
Properties and gap-fill capability of HPD-CVD phosphosilicate glass films for subquarter-micrometer ULSI device technology Vassiliev VY, Lin C, Fung D, Hsieh J, Sudijono JL Electrochemical and Solid State Letters, 3(2), 80, 2000 |