| 1 |
Artificial control of the multistep oxidation reactions catalyzed by the cytochrome P450 enzyme RosC
Iizaka Y, Kanai H, Suzuki T, Maruyama Y, Kurita M, Sano M, Watanabe A, Fukumoto A, Saito R, Anzai Y
Applied Microbiology and Biotechnology, 104(8), 3403, 2020 |
| 2 |
Enhanced Activity of the Tail-to-tail Dimerization of Michael Acceptors Catalyzed by N-Heterocyclic Carbene and Subsequent Polymer Synthesis from the Resulting Dimers
Kawai H, Fukumoto A, Matsuoka S, Suzuki M
Chemistry Letters, 48(6), 558, 2019 |
| 3 |
Investigation on Physical Properties and Morphologies of Microemulsions formed with Sodium Dodecyl Benzenesulfonate, Isobutanol, Brine, and Decane, Using Several Experimental Techniques
Fukumoto A, Dalmazzone C, Frot D, Barre L, Noik C
Energy & Fuels, 30(6), 4690, 2016 |
| 4 |
Modeling of the dissociation conditions of H-2 + CO2 semiclathrate hydrate formed with TBAB, TBAC, TBAF, TBPB, and TBNO3 salts. Application to CO2 capture from syngas
Fukumoto A, Silva LPS, Paricaud P, Dalmazzone D, Furst W
International Journal of Hydrogen Energy, 40(30), 9254, 2015 |
| 5 |
Experimental Measurements and Modeling of the Dissociation Conditions of Tetrabutylammonium Chloride Semiclathrate Hydrates in the Presence of Hydrogen
Fukumoto A, Dalmazzone D, Paricaud P, Furst W
Journal of Chemical and Engineering Data, 60(2), 343, 2015 |
| 6 |
Modeling the Dissociation Conditions of Carbon Dioxide plus TBAB, TBAC, TBAF, and TBPB Semiclathrate Hydrates
Fukumoto A, Paricaud P, Dalmazzone D, Bouchafaa W, Ho TTS, Furst W
Journal of Chemical and Engineering Data, 59(10), 3193, 2014 |
| 7 |
Oxidative Reactions of Tetrametal Pd(0)center dot center dot center dot Mo(II)-Mo(II)center dot center dot center dot Pd(0) Clusters: Electrochemical Communication of Two Pd(0) Centers through the Mo-2 Moiety and Oxidative Formation of a Pd(I)-Mo(II)-Mo(II)-Pd(I) Array
Mashima K, Shima A, Nakao K, Fukumoto A, Kaneda Y, Kusurni Y
Inorganic Chemistry, 48(5), 1879, 2009 |
| 8 |
Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions
Sawano K, Fukumoto A, Hoshi Y, Yamanaka J, Nakagawa K, Shiraki Y
Thin Solid Films, 517(1), 87, 2008 |
| 9 |
Investigation of strain states and thermal stability of strained-Si-on-Insulator (sSOI) structures
Hoshi Y, Fukumoto A, Sawano K, Cayrefourcq I, Yoshimi M, Shiraki Y
Thin Solid Films, 517(1), 340, 2008 |
| 10 |
Strained-Si nMOSFET formed on very thin SiGe buffer layer fabricated by ion implantation technique
Sawano K, Fukumoto A, Hoshi Y, Nakagawa K, Shiraki Y
Thin Solid Films, 517(1), 353, 2008 |
