| 1 |
Difference of deposition process of an amorphous carbon film due to source gases
Shinohara M, Kawazoe H, Inayoshi T, Kawakami T, Matsuda Y, Fujiyama H, Nitta Y, Nakatani T
Thin Solid Films, 518(13), 3497, 2010 |
| 2 |
Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry
Shinohara M, Cho K, Matsuda Y, Inayoshi T, Kawazoe H, Fujiyama H, Nitta Y, Nakatani T
Journal of Vacuum Science & Technology A, 27(4), 813, 2009 |
| 3 |
Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy
Shinohara M, Cho K, Shibata H, Okamoto K, Nakatani T, Matsuda Y, Fujiyama H
Thin Solid Films, 516(13), 4379, 2008 |
| 4 |
Investigation of evolution hydrocarbon species on a Si surface during methane plasma with and without substrate bias, using infrared spectroscopy in multiple internal reflection geometry
Shinohara M, Shibata H, Cho K, Nakatani T, Okamoto K, Matsuda Y, Fujiyama H
Applied Surface Science, 253(14), 6242, 2007 |
| 5 |
Infrared spectroscopic study of thermal annealing effects of hydrocarbon species on a Si surface exposed to methane plasma
Shinohara M, Watsuji K, Katagiri T, Shibata H, Matsuda Y, Fujiyama H
Applied Surface Science, 252(24), 8589, 2006 |
| 6 |
Proceedings of the Joint Meeting of the 71h APCPST (Asia Pacific Conference on Plasma Science and Technology) and the 171h SPSM (Symposium on Plasma Science for Materials) Fukuoka, Japan, June 29 July 2, 2004 - Preface
Watanabe Y, Asano T, Chang HY, Fujiyama H, McWilliams R, Watanabe T
Thin Solid Films, 506, 1, 2006 |
| 7 |
Evolution of hydrocarbon species on a silicon surface during methane plasma investigated by in-situ infrared spectroscopy
Shinohara M, Katagiri T, Iwatsuji K, Shibata H, Matsuda Y, Fujiyama H
Thin Solid Films, 506, 710, 2006 |
| 8 |
Optical emission studies of atomic and ionic species in the ionized sputter-deposition process of magnesium oxide thin films
Matsuda Y, Koyama Y, Iwaya M, Shinohara M, Fujiyama H
Thin Solid Films, 475(1-2), 113, 2005 |
| 9 |
Influence of electrode size on the generation of low-pressure coaxial ECR microplasmas
Kumamoto M, Inoue H, Matsushita A, Fujiyama H
Thin Solid Films, 475(1-2), 124, 2005 |
| 10 |
Oxidation of the hydrogen terminated silicon surfaces by oxygen plasma investigated by in-situ infrared spectroscopy
Shinohara M, Katagiri T, Iwatsuji K, Matsuda Y, Fujiyama H, Kimura Y, Niwano M
Thin Solid Films, 475(1-2), 128, 2005 |
