화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Effect of carbon on the thermal stability of a Si atomic layer on Ge(100)
Fujiu M, Takahashi K, Sakuraba M, Murota J
Applied Surface Science, 224(1-4), 206, 2004
2 Si epitaxial growth on SiH3CH3 reacted Ge(100) and intermixing between Si and Ge during heat treatment
Takahashi K, Fujiu M, Sakuraba M, Murota J
Applied Surface Science, 212, 193, 2003
3 Surface reaction of CH3SiH3 on Ge(100) and Si(100)
Takatsuka T, Fujiu M, Sakuraba M, Matsuura T, Murota J
Applied Surface Science, 162, 156, 2000
4 Epitaxial growth of Si1-x-yGexCy film on Si(100) in a SiH4-GeH4-CH3SiH3 reaction
Ichikawa A, Hirose Y, Ikeda T, Noda T, Fujiu M, Takatsuka T, Moriya A, Sakuraba M, Matsuura T, Murota J
Thin Solid Films, 369(1-2), 167, 2000