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Advantage of heteroepitaxial GaSb thin-film buffer and GaSb dot nucleation layer for GaSb/AlGaSb multiple quantum well structure grown on Si(100) substrate by molecular beam epitaxy Machida R, Akahane K, Watanabe I, Hara S, Fujikawa S, Kasamatsu A, Fujishiro HI Journal of Crystal Growth, 507, 357, 2019 |
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Effects of Ga-induced reconstructed surfaces and atomic steps on the morphology of GaSb islands on Si(100) Machida R, Toda R, Fujikawa S, Hara S, Watanabe I, Fujishiro HI Applied Surface Science, 351, 686, 2015 |
3 |
Improved electron transport properties of InSb quantum well structure using stepped buffer layer for strain reduction Fujikawa S, Taketsuru T, Tsuji D, Maeda T, Fujishiro HI Journal of Crystal Growth, 425, 64, 2015 |
4 |
Selective growth of InSb on localized area of Si(100) by molecular beam epitaxy Hara S, Iida T, Nishino Y, Uchida A, Horii H, Fujishiro HI Journal of Crystal Growth, 323(1), 397, 2011 |
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Nano-scale patterning on sulfur terminated GaAs (001) surface by scanning tunneling microscope Yagishita Y, Toda Y, Hirai M, Fujishiro HI Applied Surface Science, 237(1-4), 581, 2004 |