| 1 |
Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy
Backer SA, Suez I, Fresco ZM, Frechet JMJ, Conway JA, Vedantam S, Lee H, Yablonovitch E
Journal of Vacuum Science & Technology B, 25(4), 1336, 2007 |
| 2 |
Covalent formation of nanoscale fullerene and dendrimer patterns
Backer SA, Suez I, Fresco ZM, Rolandi M, Frechet JMJ
Langmuir, 23(5), 2297, 2007 |
| 3 |
Selective surface activation of a functional monolayer for the fabrication of nanometer scale thiol patterns and directed self-assembly of gold nanoparticles
Fresco ZM, Frechet JMJ
Journal of the American Chemical Society, 127(23), 8302, 2005 |
| 4 |
Efficient divergent synthesis of dendronized polymers with extremely high molecular weight: Structural characterization by SEC-MALLS and SFM and novel organic gelation behavior
Yoshida M, Fresco ZM, Ohnishi S, Frechet JMJ
Macromolecules, 38(2), 334, 2005 |
| 5 |
AFM-induced amine deprotection: Triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects
Fresco ZM, Suez I, Backer SA, Frechet JMJ
Journal of the American Chemical Society, 126(27), 8374, 2004 |
