| 1 |
Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the fabrication of nanorod arrays
Barth S, Derenko S, Bartzsch H, Zywitzki O, Modes T, Patrovsky F, Fiehler V, Uhlig T, Frach P, Eng LM
Thin Solid Films, 676, 1, 2019 |
| 2 |
Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition
Taeschner K, Bartzsch H, Frach P, Schultheiss E
Thin Solid Films, 520(12), 4150, 2012 |
| 3 |
Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings
Frach P, Gloess D, Bartzsch H, Taeschner K, Liebig J, Schultheiss E
Thin Solid Films, 518(11), 3105, 2010 |
| 4 |
Reactive pulse magnetron sputtered SiOxNy coatings on polymers
Lau K, Weber J, Bartzsch H, Frach P
Thin Solid Films, 517(10), 3110, 2009 |
| 5 |
Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties
Gloss D, Frach P, Gottfried C, Klinkenberg S, Liebig JS, Hentsch W, Liepack H, Krug M
Thin Solid Films, 516(14), 4487, 2008 |
| 6 |
Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Ohno S, Takasawa N, Sato Y, Yoshikawa M, Suzuki K, Frach P, Shigesato Y
Thin Solid Films, 496(1), 126, 2006 |
| 7 |
Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange S, Bartzsch H, Frach P, Goedicke K
Thin Solid Films, 502(1-2), 29, 2006 |
| 8 |
Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno S, Sato D, Kon M, Song PK, Yoshikawa M, Suzuki K, Frach P, Shigesato Y
Thin Solid Films, 445(2), 207, 2003 |
| 9 |
High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications
Frach P, Gloss D, Goedicke K, Fahland M, Gnehr WM
Thin Solid Films, 445(2), 251, 2003 |
