화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Programmed rate chemical vapor deposition protocols
Yang D, Kristof JJ, Jonnalagadda R, Rogers BR, Hillman JT, Foster RF, Cale TS
Journal of the Electrochemical Society, 147(2), 723, 2000
2 Texture and surface roughness of PRCVD aluminum films
Yang D, Jonnalagadda R, Rogers BR, Hillman JT, Foster RF, Cale TS
Thin Solid Films, 332(1-2), 312, 1998
3 Some effects of temperature ramping on metal organic chemical vapor deposited Al film nucleation
Yang D, Jonnalagadda R, Mahadev V, Cale TS, Hillman JT, Foster RF, Rogers BR
Thin Solid Films, 308-309, 615, 1997
4 Characterization of Low-Pressure Chemically Vapor-Deposited Tungsten Nitride Films
Marcus SD, Foster RF
Thin Solid Films, 236(1-2), 330, 1993