검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Deposition of HfO2 thin films in HfI4-based processes Forsgren K, Harsta A, Aarik J, Aidla A, Westlinder J, Olsson J Journal of the Electrochemical Society, 149(10), F139, 2002 |
| 2 |
Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon Kukli K, Ritala M, Uustare T, Aarik J, Forsgren K, Sajavaara T, Leskela M, Harsta A Thin Solid Films, 410(1-2), 53, 2002 |
| 3 |
Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide Kukli K, Forsgren K, Aarik J, Uustare T, Aidla A, Niskanen A, Ritala M, Leskela M, Harsta A Journal of Crystal Growth, 231(1-2), 262, 2001 |
| 4 |
Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor Kukli K, Forsgren K, Ritala M, Leskela M, Aarik J, Harsta A Journal of the Electrochemical Society, 148(12), F227, 2001 |
| 5 |
Halide chemical vapour deposition of Ta2O5 Forsgren K, Harsta A Thin Solid Films, 343-344, 111, 1999 |