검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
An atomistic mechanism for the production of two- and three-dimensional etch hillocks on Si(111) surfaces Flidr J, Huang YC, Hines MA Journal of Chemical Physics, 111(15), 6970, 1999 |
| 2 |
Extracting site-specific reaction rates from steady surface morphologies : Kinetic Monte Carlo simulations of aqueous Si(111) etching Flidr J, Huang YC, Newton TA, Hines MA Journal of Chemical Physics, 108(13), 5542, 1998 |
| 3 |
Dynamic repulsion of surface steps during step flow etching: Controlling surface roughness with chemistry Huang YC, Flidr J, Newton TA, Hines MA Journal of Chemical Physics, 109(12), 5025, 1998 |