화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Molecular model of phenolic polymer dissolution in photolithography
Flanagin LW, Singh VK, Willson CG
Journal of Polymer Science Part B: Polymer Physics, 37(16), 2103, 1999
2 Surface roughness development during photoresist dissolution
Flanagin LW, Singh VK, Willson CG
Journal of Vacuum Science & Technology B, 17(4), 1371, 1999
3 Mechanism of phenolic polymer dissolution: Importance of acid-base equilibria
Flanagin LW, McAdams CL, Hinsberg WD, Sanchez IC, Willson CG
Macromolecules, 32(16), 5337, 1999
4 Ion Solvation in Supercritical Water-Based on an Adsorption Analogy
Flanagin LW, Balbuena PB, Johnston KP, Rossky PJ
Journal of Physical Chemistry B, 101(40), 7998, 1997
5 The Mechanism of Phenolic Polymer Dissolution - A New Perspective
Tsiartas PC, Flanagin LW, Henderson CL, Hinsberg WD, Sanchez IC, Bonnecaze RT, Willson CG
Macromolecules, 30(16), 4656, 1997
6 Temperature and Density Effects on an S(N)2 Reaction in Supercritical Water
Flanagin LW, Balbuena PB, Johnston KP, Rossky PJ
Journal of Physical Chemistry, 99(14), 5196, 1995