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| No. | Article |
|---|---|
| 1 |
Self-aligned double patterning process for subtractive Ge fin fabrication at 45-nm pitch Milenin AP, Witters L, Barla K, Thean A Thin Solid Films, 602, 64, 2016 |
| No. | Article |
|---|---|
| 1 |
Self-aligned double patterning process for subtractive Ge fin fabrication at 45-nm pitch Milenin AP, Witters L, Barla K, Thean A Thin Solid Films, 602, 64, 2016 |