| 1 |
An experimental and theoretical study of the effect of Ce doping in ZnO/CNT composite thin film with enhanced visible light photo-catalysis
Elias M, Uddin MN, Hossain MA, Saha JK, Siddiquey IA, Sarker DR, Diba ZR, Uddin J, Choudhury MHR, Firoz SH
International Journal of Hydrogen Energy, 44(36), 20068, 2019 |
| 2 |
Effects of radio frequency power and gas ratio on barrier properties of SiOxNy films deposited by inductively coupled plasma chemical vapor deposition
Bang SH, Suk JH, Kim KS, Park JH, Hwang NM
Thin Solid Films, 669, 108, 2019 |
| 3 |
Improvement of NiMoNb to polyimide adhesion by inductively coupled nitrogen plasma treatment
Bang SH
Applied Surface Science, 360, 553, 2016 |
| 4 |
Redox Reactions at Cu,Ag/Ta2O5 Interfaces and the Effects of Ta2O5 Film Density on the Forming Process in Atomic Switch Structures
Tsuruoka T, Valov I, Tappertzhofen S, van den Hurk J, Hasegawa T, Waser R, Aono M
Advanced Functional Materials, 25(40), 6374, 2015 |
| 5 |
Growth of co-sputtered titanium-strontium films: influence of strontium concentration and ion bombardment
Sillassen M, Rosendal SJ, Louring S, Madsen ND, Bottiger J
Thin Solid Films, 550, 170, 2014 |
| 6 |
Effect of dangling bonds of ultra-thin silicon film surface on electronic states of internal atoms
Kamiyama E, Sueoka K
Applied Surface Science, 258(13), 5265, 2012 |
| 7 |
Controlling wear failure of graphite-like carbon film in aqueous environment: Two feasible approaches
Wang YX, Wang LP, Xue QJ
Applied Surface Science, 257(9), 4370, 2011 |
| 8 |
Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Physical and mechanical properties of deposited Si : C : N films
Blaszczyk-Lezak I, Wrobel AM
Applied Surface Science, 253(18), 7404, 2007 |
| 9 |
Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si
Cappelli E, Orlando S, Servidori M, Scilletta C
Applied Surface Science, 254(4), 1273, 2007 |
| 10 |
Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films
Blaszczyk-Lezak I, Wrobel AM, Bielinski DM
Thin Solid Films, 497(1-2), 35, 2006 |
