화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching
Filippi RG, Gribelyuk MA, Joseph T, Kane T, Sullivan TD, Clevenger LA, Costrini G, Gambino J, Iggulden RC, Kiewra EW, Ning XJ, Ravikumar R, Schnabel RF, Stojakovic G, Weber SJ, Gignac LM, Hu CK, Rath DL, Rodbell KP
Thin Solid Films, 388(1-2), 303, 2001
2 Electromigration Behavior of Hot-Sputtered Al(Cu) Versus Chemical-Vapor-Deposition W Vias
Filippi RG, Levine EN, Rodbell KP
Journal of Vacuum Science & Technology B, 15(3), 750, 1997