화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Silicidation and carburization of the tungsten filament in HWCVD with silacyclobutane precursor gases
Shi YJ, Tong L, Eustergerling BD, Li XM
Thin Solid Films, 519(14), 4442, 2011
2 Effect of filament temperature and deposition time on the formation of tungsten silicide with silane
Sveen CE, Shi YJ
Thin Solid Films, 519(14), 4447, 2011
3 Effect of ammonia on Ta filaments in the hot wire CVD process
Verlaan V, van der Werf CHM, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3435, 2009