화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Copper electroplating to fill blind vias for three-dimensional integration
Spiesshoefer S, Patel J, Lam T, Cai L, Polamreddy S, Figueroa RF, Burkett SL, Schaper L, Geil R, Rogers B
Journal of Vacuum Science & Technology A, 24(4), 1277, 2006
2 Control of sidewall slope in silicon vias using SF6/O-2 plasma etching in a conventional reactive ion etching tool
Figueroa RF, Spiesshoefer S, Burkett SL, Schaper L
Journal of Vacuum Science & Technology B, 23(5), 2226, 2005