검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Influence of partial charge on the material removal rate during chemical polishing Suratwala T, Steele R, Miller PE, Wong LN, Destino JF, Feigenbaum E, Shen N, Feit M Journal of the American Ceramic Society, 102(4), 1566, 2019 |
| 2 |
Nanoplastic removal function and the mechanical nature of colloidal silica slurry polishing Shen N, Feigenbaum E, Suratwala T, Steele W, Wong LN, Feit MD, Miller PE Journal of the American Ceramic Society, 102(6), 3141, 2019 |