검색결과 : 15건
No. | Article |
---|---|
1 |
Lithographically directed surface modification Kingsborough RP, Goodman RB, Fedynyshyn TH Journal of Vacuum Science & Technology B, 27(6), 3031, 2009 |
2 |
Contributions of resist polymers to innate material roughness Fedynyshyn TH, Astolfi DK, Goodman RB, Cann S, Roberts J Journal of Vacuum Science & Technology B, 26(6), 2281, 2008 |
3 |
Immersion patterning down to 27 nm half pitch Bloomstein TM, Fedynyshyn TH, Pottebaum I, Marchant MF, Deneault SJ, Rothschild M Journal of Vacuum Science & Technology B, 24(6), 2789, 2006 |
4 |
Contribution of photoacid generator to material roughness Fedynyshyn TH, Pottebaum I, Astolfi DK, Cabral A, Roberts J, Meagley R Journal of Vacuum Science & Technology B, 24(6), 3031, 2006 |
5 |
Hybrid optical maskless lithography: Scaling beyond the 45 nm node Fritze M, Bloomstein TM, Tyrrell B, Fedynyshyn TH, Efremow NN, Hardy DE, Cann S, Lennon D, Spector S, Rothschild M, Brooker P Journal of Vacuum Science & Technology B, 23(6), 2743, 2005 |
6 |
Photospeed considerations for extreme ultraviolet lithography resists Dentinger PM, Hunter LL, O'Connell DJ, Gunn S, Goods D, Fedynyshyn TH, Goodman RB, Astolfi DK Journal of Vacuum Science & Technology B, 20(6), 2962, 2002 |
7 |
Polymer photochemistry at advanced optical wavelengths Fedynyshyn TH, Kunz RR, Sinta RF, Goodman RB, Doran SP Journal of Vacuum Science & Technology B, 18(6), 3332, 2000 |
8 |
Encapsulation of nanosized silica by in situ polymerization of tert-butyl acrylate monomer Sondi I, Fedynyshyn TH, Sinta R, Matijevic E Langmuir, 16(23), 9031, 2000 |
9 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
10 |
Optimizing the resist to the aerial image in a chemically amplified system Fedynyshyn TH, Szmanda CR, Cernigliaro GJ Journal of Vacuum Science & Technology B, 15(6), 2587, 1997 |