화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Lithographically directed surface modification
Kingsborough RP, Goodman RB, Fedynyshyn TH
Journal of Vacuum Science & Technology B, 27(6), 3031, 2009
2 Contributions of resist polymers to innate material roughness
Fedynyshyn TH, Astolfi DK, Goodman RB, Cann S, Roberts J
Journal of Vacuum Science & Technology B, 26(6), 2281, 2008
3 Immersion patterning down to 27 nm half pitch
Bloomstein TM, Fedynyshyn TH, Pottebaum I, Marchant MF, Deneault SJ, Rothschild M
Journal of Vacuum Science & Technology B, 24(6), 2789, 2006
4 Contribution of photoacid generator to material roughness
Fedynyshyn TH, Pottebaum I, Astolfi DK, Cabral A, Roberts J, Meagley R
Journal of Vacuum Science & Technology B, 24(6), 3031, 2006
5 Hybrid optical maskless lithography: Scaling beyond the 45 nm node
Fritze M, Bloomstein TM, Tyrrell B, Fedynyshyn TH, Efremow NN, Hardy DE, Cann S, Lennon D, Spector S, Rothschild M, Brooker P
Journal of Vacuum Science & Technology B, 23(6), 2743, 2005
6 Photospeed considerations for extreme ultraviolet lithography resists
Dentinger PM, Hunter LL, O'Connell DJ, Gunn S, Goods D, Fedynyshyn TH, Goodman RB, Astolfi DK
Journal of Vacuum Science & Technology B, 20(6), 2962, 2002
7 Polymer photochemistry at advanced optical wavelengths
Fedynyshyn TH, Kunz RR, Sinta RF, Goodman RB, Doran SP
Journal of Vacuum Science & Technology B, 18(6), 3332, 2000
8 Encapsulation of nanosized silica by in situ polymerization of tert-butyl acrylate monomer
Sondi I, Fedynyshyn TH, Sinta R, Matijevic E
Langmuir, 16(23), 9031, 2000
9 157 nm: Deepest deep-ultraviolet yet
Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C
Journal of Vacuum Science & Technology B, 17(6), 3262, 1999
10 Optimizing the resist to the aerial image in a chemically amplified system
Fedynyshyn TH, Szmanda CR, Cernigliaro GJ
Journal of Vacuum Science & Technology B, 15(6), 2587, 1997