| 1 |
Physical properties of the ferroelectric capacitors based on Al-doped HfO2 grown via Atomic Layer Deposition on Si
Vulpe S, Nastase F, Dragoman M, Dinescu A, Romanitan C, Iftimie S, Moldovan A, Apostol N
Applied Surface Science, 483, 324, 2019 |
| 2 |
Electrical properties of BaTiO3 based ferroelectric capacitors grown on oxide sacrificial layers for micro-cantilevers applications
Vasta G, Jackson TJ, Tarte E
Thin Solid Films, 520(7), 3071, 2012 |
| 3 |
Low Voltage Operation of Nonvolatile Ferroelectric Capacitors Using Poly(vinylidene fluoride-trifluoroethylene) Copolymer and Thin Al2O3 Insulating Layer
Jung SW, Yoon SM, Kang SY, Choi KJ, Shin WC, Yu BG
Electrochemical and Solid State Letters, 12(9), H325, 2009 |
| 4 |
Study of platinum electrode patterning in a reactive ion etcher
Chang LH, Apen E, Kottke M, Tracy C
Journal of Vacuum Science & Technology A, 16(3), 1489, 1998 |
| 5 |
Conditioning effects on RTP (Pb,Ca)TiO3 thin films
Jimenez R, Calzada ML, Mendiola J
Thin Solid Films, 335(1-2), 292, 1998 |
| 6 |
Pulsed-Laser Deposition Preparation and Properties of Srbi2Ta2O9 Thin-Films
Yang PX, Zheng LR, Zhang M, Lin CL
Thin Solid Films, 305(1-2), 48, 1997 |
