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| No. | Article |
|---|---|
| 1 |
Integration of unit processes in a shallow trench isolation module for a 0.25 mu m complementary metal-oxide semiconductor technology Chatterjee A, Ali I, Joyner K, Mercer D, Kuehne J, Mason M, Esquivel A, Rogers D, O'Brien S, Mei P, Murtaza S, Kwok SP, Taylor K, Nag S, Hames G, Hanratty M, Marchman H, Ashburn S, Chen IC Journal of Vacuum Science & Technology B, 15(6), 1936, 1997 |