검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Oxygen termination of homoepitaxial diamond surface by ozone and chemical methods: An experimental and theoretical perspective Navas J, Araujo D, Piner JC, Sanchez-Coronilla A, Blanco E, Villar P, Alcantara R, Montserrat J, Florentin M, Eon D, Pernot J Applied Surface Science, 433, 408, 2018 |
| 2 |
Atomic composition of WC/ and Zr/O-terminated diamond Schottky interfaces close to ideality Pinero JC, Araujo D, Fiori A, Traore A, Villar MP, Eon D, Muret P, Pernot J, Teraji T Applied Surface Science, 395, 200, 2017 |
| 3 |
New method for interface characterization in heterojunction solar cells based on diffusion capacitance measurements Gudovskikh AS, Chouffot R, Kleider JP, Kaluzhniy NA, Lantratov VM, Mintairov SA, Damon-Lacoste J, Eon D, Cabarrocas PRI, Ribeyron PJ Thin Solid Films, 516(20), 6786, 2008 |
| 4 |
Etch mechanisms of hybrid low-k material (SiOCH with porogen) in fluorocarbon based plasma Eon D, Damon M, Chevolleaua T, David T, Vallier L, Joubert O Journal of Vacuum Science & Technology B, 25(3), 715, 2007 |
| 5 |
Etching characteristics of TiN used as hard mask in dielectric etch process Darnon M, Chevolleau T, Eon D, Vallier L, Torres J, Joubert O Journal of Vacuum Science & Technology B, 24(5), 2262, 2006 |
| 6 |
Plasma oxidation of polyhedral oligomeric silsesquioxane polymers Eon D, Raballand V, Cartry G, Cardinaud C, Vourdas N, Argitis P, Gogolides E Journal of Vacuum Science & Technology B, 24(6), 2678, 2006 |
| 7 |
Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopy Eon D, Cartry G, Fernandez V, Cardinaud C, Tegou E, Bellas V, Argitis P, Gogolides E Journal of Vacuum Science & Technology B, 22(5), 2526, 2004 |
| 8 |
Etching behavior of Si-containing polymers as resist materials for bilayer lithography: The case of poly-dimethyl siloxane Tserepi A, Cordoyiannis G, Patsis GP, Constantoudis V, Gogolides E, Valamontes ES, Eon D, Peignon MC, Cartry G, Cardinaud C, Turban G Journal of Vacuum Science & Technology B, 21(1), 174, 2003 |
| 9 |
Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2 Gaboriau F, Peignon MC, Cartry G, Rolland L, Eon D, Cardinaud C, Turban G Journal of Vacuum Science & Technology A, 20(3), 919, 2002 |