검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Static dissolution rate of tungsten film versus chemical adjustments of a reused slurry for chemical mechanical polishing Coetsier CM, Testa F, Carretier E, Ennahali M, Laborie B, Mouton-arnaud C, Fluchere O, Moulin P Applied Surface Science, 257(14), 6163, 2011 |
| 2 |
Retreatment of silicon slurry by membrane processes Testa F, Coetsier C, Carretier E, Ennahali M, Laborie B, Serafino C, Bulgarelli F, Moulin P Journal of Hazardous Materials, 192(2), 440, 2011 |