검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
PREVAIL-EPL alpha tool: Early results Golladay SD, Pfeiffer HC, Bohnenkamp CA, Dhaliwal RS, Enichen WA, Gordon MS, Kendall RA, Lieberman JE, Stickel W, Rockrohr JD, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Miura T, Okino T, Kawata S, Morita K, Suzuki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Sogard M Journal of Vacuum Science & Technology B, 19(6), 2459, 2001 |
| 2 |
PREVAIL: Dynamic correction of aberrations Gordon MS, Enichen WA, Golladay SD, Pfeiffer HC, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3079, 2000 |
| 3 |
EL5: One tool for advanced x-ray and chrome on glass mask making Sturans MA, Hartley JG, Pfeiffer HC, Dhaliwal RS, Groves TR, Pavick JW, Quickle RJ, Clement CS, Dick GJ, Enichen WA, Gordon MS, Kendall RA, Kostek CA, Pinckney DJ, Robinson CF, Rockrohr JD, Safran JM, Senesi JJ, Tressler EV Journal of Vacuum Science & Technology B, 16(6), 3164, 1998 |
| 4 |
Performance Enhancements on IBMs El-4 Electron-Beam Lithography System Butsch R, Enichen WA, Gordon MS, Groves TR, Hartley JG, Pavick JW, Pfeiffer HC, Quickle RJ, Rockrohr JD, Stickel W Journal of Vacuum Science & Technology B, 13(6), 2478, 1995 |
| 5 |
El-4, a New-Generation Electron-Beam Lithography System Pfeiffer HC, Davis DE, Enichen WA, Gordon MS, Groves TR, Hartley JG, Quickle RJ, Rockrohr JD, Stickel W, Weber EV Journal of Vacuum Science & Technology B, 11(6), 2332, 1993 |