화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Experimental and computer simulation studies of the "baffled target" reactive sputtering process
Engelmark F, Westlinder J, Nyberg T, Berg S
Journal of Vacuum Science & Technology A, 21(6), 1981, 2003
2 Selective etching of AI/AIN structures for metallization of surface acoustic wave devices
Engelmark F, Iriarte GF, Katardjiev IV
Journal of Vacuum Science & Technology B, 20(3), 843, 2002
3 Simulation and dielectric characterization of reactive dc magnetron cosputtered (Ta2O5)(1-x)(TiO2)(x) thin films
Westlinder J, Zhang Y, Engelmark F, Possnert G, Blom HO, Olsson J, Berg S
Journal of Vacuum Science & Technology B, 20(3), 855, 2002
4 Li conduction in sputtered amorphous Ta2O5
Frenning G, Engelmark F, Niklasson GA, Stromme M
Journal of the Electrochemical Society, 148(5), A418, 2001
5 Structural and electroacoustic studies of AIN thin films during low temperature radio frequency sputter deposition
Engelmark F, Iriarte GF, Katardjiev IV, Ottosson M, Muralt P, Berg S
Journal of Vacuum Science & Technology A, 19(5), 2664, 2001
6 Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition
Engelmark F, Fucntes G, Katardjiev IV, Harsta A, Smith U, Berg S
Journal of Vacuum Science & Technology A, 18(4), 1609, 2000
7 Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching
Jonsson LB, Westlinder J, Engelmark F, Hedlund C, Du J, Smith U, Blom HO
Journal of Vacuum Science & Technology B, 18(4), 1906, 2000