검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Surface chemistry and fundamental limitations on the plasma cleaning of metals Dong B, Driver MS, Emesh I, Shaviv R, Kelber JA Applied Surface Science, 384, 294, 2016 |
| 2 |
Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers Sun YM, Lee SY, Lemonds AM, Engbrecht ER, Veldman S, Lozano J, White JM, Ekerdt JG, Emesh I, Pfeifer K Thin Solid Films, 397(1-2), 109, 2001 |
| 3 |
Growth, Selectivity and Adhesion of CVD-Deposited Copper from Cu+1 (Hexafluoroacetylacetonate Trimethylvinylsilane) and Dichlorodimethylsilane Webb JB, Northcott D, Emesh I Thin Solid Films, 270(1-2), 483, 1995 |