| 1 |
Low temperature growth of heavy boron-doped hydrogenated Ge epilayers and its application in Ge/Si photodetectors
Kuo WC, Lee MJ, Wu ML, Lee CC, Tsao IY, Chang JY
Solid-State Electronics, 130, 41, 2017 |
| 2 |
Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Mateos D, Diniz JA, Nedev N, Munoz SNM, Curiel M, Mederos M, Valdez B, Montero G
Thin Solid Films, 628, 96, 2017 |
| 3 |
Low temperature growth of highly conductive boron-doped germanium thin films by electron cyclotron resonance chemical vapor deposition
Chang TH, Chang C, Chu YH, Lee CC, Chang JY, Chen IC, Li T
Thin Solid Films, 551, 53, 2014 |
| 4 |
Comparative and integrative study of Langmuir probe and optical emission spectroscopy in a variable magnetic field electron cyclotron resonance chemical vapor deposition process used for depositing hydrogenated amorphous silicon thin films
Hu LC, Ruan GM, Wei TC, Wang CJ, Lin YW, Lee CC, Kawai Y, Li TT
Thin Solid Films, 570, 574, 2014 |
| 5 |
Low-temperature Si epitaxy on large-grained polycrystalline seed layers by electron-cyclotron resonance chemical vapor deposition
Rau B, Sieber I, Schneider J, Muske M, Stoger-Pollach M, Schattschneider P, Gall S, Fuhs W
Journal of Crystal Growth, 270(3-4), 396, 2004 |
| 6 |
Growth characterization and properties of diamond-like carbon films by electron cyclotron resonance chemical vapor deposition
Lung BH, Chiang MJ, Hon MH
Thin Solid Films, 392(1), 16, 2001 |
| 7 |
Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
Zhang DH, Gao Y, Wei J, Mo ZQ
Thin Solid Films, 377-378, 607, 2000 |
| 8 |
Optical properties of diamond-like carbon synthesized by plasma immersion ion processing
He XM, Bardeau JF, Lee DH, Walter KC, Tuszewski M, Nastasi M
Journal of Vacuum Science & Technology B, 17(2), 822, 1999 |
| 9 |
A novel approach to the formation of amorphous carbon nitride film on silicon by ECR-CVD
Sung SL, Tseng CH, Chiang FK, Guo XJ, Liu XW, Shih HC
Thin Solid Films, 340(1-2), 169, 1999 |
| 10 |
ECR플라즈마를 이용한 화학증착법에 의해 제조된 실리콘 산화막의 특성
전법주, 오인환, 임태훈, 정일현
HWAHAK KONGHAK, 35(3), 374, 1997 |
