| 1 |
The influence of carbon on the structure and photoluminescence of amorphous silicon carbonitride thin films
Khatami Z, Wilson PR, Wojcik J, Mascher P
Thin Solid Films, 622, 1, 2017 |
| 2 |
Deposition of silicon oxycarbide thin films from an organosilicon source for polycarbonate glazing
Lee SE, Park YC
Thin Solid Films, 638, 354, 2017 |
| 3 |
Electrochemical characteristics of bundle-type silicon nanorods as an anode material for lithium ion batteries
Nguyen SH, Lim JC, Lee JK
Electrochimica Acta, 74, 53, 2012 |
| 4 |
Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering
Kikuchi Y, Gao J, Sano T, Ohmi S
Thin Solid Films, 520(7), 2989, 2012 |
| 5 |
Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition
Barve SA, Jagannath, Mithal N, Deo MN, Biswas A, Mishra R, Kishore R, Bhanage BM, Gantayet LM, Patil DS
Thin Solid Films, 519(10), 3011, 2011 |
| 6 |
Effect of bias in patterning diamond by a dual electron cyclotron resonance-radio-frequency oxygen plasma
Wang L, Zhu XD, Ke B, Ni TL, Ding F, Chen MD, Wen XH, Zhou HY
Thin Solid Films, 518(8), 1985, 2010 |
| 7 |
Hydrogen-free diamond-like carbon films prepared by microwave electron cyclotron resonance plasma-enhanced direct current magnetron sputtering
Ru LL, Huang JJ, Gao LA, Qi B
Thin Solid Films, 519(1), 86, 2010 |
| 8 |
Characterization of all-solid-state secondary batteries with LiCoO2 thin films prepared by ECR sputtering as positive electrodes
Takahashi M, Hayashi M, Shodai T
Journal of Power Sources, 189(1), 191, 2009 |
| 9 |
Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition
Sakaguchi I, Ryoken H, Hishita S, Haneda H
Thin Solid Films, 506, 184, 2006 |
| 10 |
Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition
Matsumoto T, Niino A, Numata K, Saito H, Miyake S
Thin Solid Films, 476(1), 73, 2005 |
