검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control El Chemali C, Freudenberg J, Hankinson M, Collison W, Ni T Journal of Vacuum Science & Technology B, 21(6), 2304, 2003 |
| 2 |
Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategy El Chemali C, Moyne J, Khan K, Nadeau R, Smith P, Colt J, Chapple-Sokol J, Parikh T Journal of Vacuum Science & Technology A, 18(4), 1287, 2000 |