검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants Merkulov A, Peres P, Choi S, Horreard F, Ehrke HU, Loibl N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C48, 2010 |
| 2 |
Shallow As dose measurements of patterned wafers with secondary ion mass spectrometry and low energy electron induced x-ray emission spectroscopy Ehrke HU, Loibl N, Moret MP, Horreard F, Choi J, Hombourger C, Paret V, Benbalagh R, Morel N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C54, 2010 |
| 3 |
"Non-destructive" B, P and As dosimetry using normal incidence oxygen Maul H, Ehrke HU, Loibl N, Schnurer-Patschan C Applied Surface Science, 252(19), 7269, 2006 |
| 4 |
Theoretical Investigation of the NEXAFS Spectra of Acrylonitrile Near the Carbon and the Nitrogen K-Edge Wilhelmy I, Laffon C, Ehrke HU, Wurth W, Rosch N Journal of Physical Chemistry, 99(21), 8496, 1995 |