화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Mechanism of Co Liner as Enhancement Layer for Cu Interconnect Gap-Fill
He M, Zhang X, Nogami T, Lin X, Kelly J, Kim H, Spooner T, Edelstein D, Zhao L
Journal of the Electrochemical Society, 160(12), D3040, 2013
2 Electrodeposited Cu Film Morphology on Thin PVD Cu Seed Layers
Kelly J, Lin X, Nogami T, van der Straten O, Demarest J, Li J, Murphy R, Zhang X, Penny C, Parks C, Edelstein D
Journal of the Electrochemical Society, 160(12), D3171, 2013
3 Effects of Contact Area on Mechanical Strength, Electrical Resistance, and Electromigration Reliability of Cu/Low-k Interconnects
Yang CC, Shaw T, Simon A, Edelstein D
Electrochemical and Solid State Letters, 13(6), II197, 2010
4 Normalizing mitochondrial superoxide production blocks three pathways of hyperglycaemic damage
Nishikawa T, Edelstein D, Du XL, Yamagishi S, Matsumura T, Kaneda Y, Yorek MA, Beebe D, Oates PJ, Hammes HP, Giardino I, Brownlee M
Nature, 404(6779), 787, 2000
5 Computing vibrational energy relaxation for high-frequency modes in condensed environments (vol 107, pg 10470, 1997)
Rostkier-Edelstein D, Graf P, Nitzan A
Journal of Chemical Physics, 108(22), 9598, 1998
6 Computing vibrational energy relaxation for high-frequency modes in condensed environments
Rostkier-Edelstein D, Graf P, Nitzan A
Journal of Chemical Physics, 107(24), 10470, 1997