| 1 |
High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition
Takenaka K, Setsuhara Y, Han JG, Uchida G, Ebe A
Thin Solid Films, 685, 306, 2019 |
| 2 |
Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units
Setsuhara Y, Cho K, Takenaka K, Ebe A, Shiratani M, Sekine M, Hori M, Ikenaga E, Kondo H, Nakatsuka O, Zaima S
Thin Solid Films, 518(3), 1006, 2009 |
| 3 |
Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor deposition
Kuratani N, Ebe A, Ogata K, Shimizu I, Setsuhara Y, Miyake S
Journal of Vacuum Science & Technology A, 19(1), 153, 2001 |
| 4 |
Influences of ion energy on morphology and preferred orientation of chromium thin films prepared by ion beam and vapor deposition
Kuratani N, Ebe A, Ogata K
Journal of Vacuum Science & Technology A, 16(4), 2489, 1998 |
| 5 |
Roles of Ion Irradiation for Crystalline Growth and Internal-Stresses in Nickel Films Onto Silicon Substrates Prepared by the Ion-Beam and Vapor-Deposition Method
Kuratani N, Murakami Y, Imai O, Ebe A, Nishiyama S, Ogata K
Journal of Vacuum Science & Technology A, 15(6), 3086, 1997 |
| 6 |
Boron-Nitride Hard Coatings by Ion-Beam and Vapor-Deposition
Nishiyama S, Takahashi E, Iwamoto Y, Ebe A, Kuratani N, Ogata K
Thin Solid Films, 281-282, 327, 1996 |
| 7 |
Study on the Internal-Stress in Nickel Films Deposited Onto Silicon Substrates by Ion-Beam and Vapor-Deposition (Ivd)
Kuratani N, Murakami Y, Imai O, Ebe A, Nishiyama S, Ogata K
Thin Solid Films, 281-282, 352, 1996 |
| 8 |
Improvement of the Adhesion to Polyimide Substrates of Copper-Films Prepared by an Ion-Beam and Vapor-Deposition (Ivd) Method
Ebe A, Takahashi E, Iwamoto Y, Kuratani N, Nishiyama S, Imai O, Ogata K, Setsuhara Y, Miyake S
Thin Solid Films, 281-282, 356, 1996 |
