검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries Lee BJ, Efremov A, Lee J, Kwon KH Plasma Chemistry and Plasma Processing, 39(1), 325, 2019 |
| 2 |
Reduction of nitrogen dioxide from etching vent gases by scrubbing with caustic sodium sulfide solution Wu CY, Chou MS Journal of Chemical Technology and Biotechnology, 89(12), 1850, 2014 |
| 3 |
Texture optimization process of ZnO:Al thin films using NH4Cl aqueous solution for applications as antireflective coating in thin film solar cells Fernandez S, Gandia JJ Thin Solid Films, 520(14), 4698, 2012 |
| 4 |
Optimal design of multi-nozzle etching process for shadow mask Seo M, Park JS, Park S, Jung JH Korean Journal of Chemical Engineering, 26(6), 1519, 2009 |
| 5 |
Plasma/reactor walls interactions in advanced gate etching processes Ramos R, Cunge G, Joubert O, Sadeghi N, Mori M, Vallier L Thin Solid Films, 515(12), 4846, 2007 |
| 6 |
Etching of SiC with fluorine ECR plasma Forster C, Cimalla V, Kosiba R, Ecke G, Weih P, Ambacher O, Pezoldt J Materials Science Forum, 457-460, 821, 2004 |
| 7 |
Sidewall slope control of chemically assisted ion-beam etched structures in InP-based materials Daleiden J, Czotscher K, Hoffmann C, Kiefer R, Klussmann S, Muller S, Nutsch A, Pletschen W, Weisser S, Trankle G, Braunstein J, Weimann G Journal of Vacuum Science & Technology B, 16(4), 1864, 1998 |