검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Self-consistent charge-up simulation for the microscopic feature of SiO2 layer in rf capacitive discharge Lee SH, Lee JK, Jung SW, Kim DW, You SJ Current Applied Physics, 15(11), 1463, 2015 |
| 2 |
A simple analysis on the abnormal behavior of the argon metastable density in an inductively coupled Ar plasma Park M, Chang HY, You SJ, Kim JH, Seong DJ, Shin YH Thin Solid Films, 518(22), 6694, 2010 |
| 3 |
Coulomb collisions in materials processing plasmas Nanbu K, Furubayashi T, Takekida H Thin Solid Films, 506, 720, 2006 |
| 4 |
Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges Kim SS, Chung CW, Chang HY Thin Solid Films, 435(1-2), 72, 2003 |
| 5 |
Formation of negative hydrogen ions in a Ne-H-2 hollow cathode discharge Petrov GM, Petrova T Plasma Chemistry and Plasma Processing, 22(4), 573, 2002 |