1 |
Quantitative SIMS measurement of high concentration of boron in silicon (up to 20 at.%) using an isotopic comparative method Dubois C, Prudon G, Gautier B, Dupuy JC Applied Surface Science, 255(4), 1377, 2008 |
2 |
Deconvolution of SIMS depth profiles: Towards simple and faster techniques Boulsina F, Berrabah M, Dupuy JC Applied Surface Science, 255(5), 1946, 2008 |
3 |
AFM study of the SIMS beam induced roughness in monocrystalline silicon in presence of initial surface or bulk defects of nanometric size Fares B, Dubois C, Gautier B, Dupuy JC, Cayrel F, Gaudin G Applied Surface Science, 252(19), 6448, 2006 |
4 |
Deconvolution of very low primary energy SIMS depth profiles2w Fares B, Gautier B, Dupuy JC, Prudon G, Holliger P Applied Surface Science, 252(19), 6478, 2006 |
5 |
Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique O-2(+) bombardment Fares B, Gautier B, Holliger P, Baboux N, Prudon G, Dupuy JC Applied Surface Science, 253(5), 2662, 2006 |
6 |
Imaging by atomic force microscopy of the electrical properties difference of the facets of oxygen-ion-induced ripple topography in silicon Gautier B, Fares B, Prudon G, Dupuy JC Applied Surface Science, 231-2, 136, 2004 |
7 |
Backside and frontside depth profiling of B delta doping, at low energy, using new and previous magnetic SIMS instruments Laugier F, Hartmann JM, Moriceau H, Holliger P, Truche R, Dupuy JC Applied Surface Science, 231-2, 668, 2004 |
8 |
Influence of surface orientation on the formation of sputtering-induced ripple topography in silicon Fares B, Gautier B, Baboux N, Prudon G, Holliger P, Dupuy JC Applied Surface Science, 231-2, 678, 2004 |
9 |
Comparison between Xe+ and O-2(+) primary ions, at low impact energy, on B delta-doping, SiGe-Si superlattice and Al/Ti multilayer structures Laugier F, Holliger P, Dupuy JC, Baboux N Applied Surface Science, 203, 348, 2003 |
10 |
Ultra-low energy SIMS analysis of boron deltas in silicon Baboux N, Dupuy JC, Prudon G, Holliger P, Laugier F, Papon AM, Hartmann JM Journal of Crystal Growth, 245(1-2), 1, 2002 |