검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks Spector SJ, Astolfi DK, Doran SP, Lyszczarz TM, Raynolds JE Journal of Vacuum Science & Technology B, 19(6), 2757, 2001 |
| 2 |
Polymer photochemistry at advanced optical wavelengths Fedynyshyn TH, Kunz RR, Sinta RF, Goodman RB, Doran SP Journal of Vacuum Science & Technology B, 18(6), 3332, 2000 |
| 3 |
Photolithography at 0.10 and 0.13 mu m using ArF excimer laser lithography in combination with resolution enhancement techniques Chan M, Kunz RR, Doran SP, Rothschild M Journal of Vacuum Science & Technology B, 15(6), 2404, 1997 |
| 4 |
Evaluation of Depth-of-Focus in Photolithography at 193 and 248 nm for Feature Sizes of 0.25 Mu-M and Below Rothschild M, Doran SP, Barouch E, Hollerbach U, Orszag SA Journal of Vacuum Science & Technology B, 11(6), 2720, 1993 |