| 1 |
Optical and Mass Spectrometric Measurements of the CH4-CO2 Dry Reforming Process in a Low Pressure, Very High Density, and Purely Inductive Plasma
Li HY, Zhou YL, Donnelly VM
Journal of Physical Chemistry A, 124(36), 7271, 2020 |
| 2 |
Dilute hydrogen plasma cleaning of boron from silicon after etching of HfO2 films in BCl3 plasmas: Substrate temperature dependence
Wang C, Donnelly VM
Journal of Vacuum Science & Technology A, 27(1), 114, 2009 |
| 3 |
Auger electron spectroscopy study of reactor walls in transition from an O-2 to a Cl-2 plasma
Guha J, Donnelly VM
Journal of Vacuum Science & Technology A, 27(3), 515, 2009 |
| 4 |
Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O-2 plasmas using trace rare gases optical emission spectroscopy
Chen ZY, Donnelly VM, Economou DJ, Chen L, Funk M, Sundararajan R
Journal of Vacuum Science & Technology A, 27(5), 1159, 2009 |
| 5 |
Recombination probability of oxygen atoms on dynamic stainless steel surfaces in inductively coupled O-2 plasmas
Stafford L, Guha J, Donnelly VM
Journal of Vacuum Science & Technology A, 26(3), 455, 2008 |
| 6 |
Mechanisms and selectivity for etching of HfO2 and Si in BCl3 plasmas
Wang CY, Donnelly VM
Journal of Vacuum Science & Technology A, 26(4), 597, 2008 |
| 7 |
Auger electron spectroscopy of surfaces during exposure to gaseous discharges
Guha J, Pu YK, Donnelly VM
Journal of Vacuum Science & Technology A, 25(2), 347, 2007 |
| 8 |
Effect of surface roughness of the neutralization grid on the energy and flux of fast neutrals and residual ions extracted from a neutral beam source
Ranjan A, Helmbrecht C, Donnelly VM, Economou DJ, Franz GF
Journal of Vacuum Science & Technology B, 25(1), 258, 2007 |
| 9 |
Effectiveness of dilute H-2 plasmas in removing boron from Si after etching of HfO2 films in BCl3 plasmas
Wang C, Donnelly VM
Journal of Vacuum Science & Technology A, 24(1), 41, 2006 |
| 10 |
Energy distribution and flux of fast neutrals and residual ions extracted from a neutral beam source
Ranjan A, Donnelly VM, Economou DJ
Journal of Vacuum Science & Technology A, 24(5), 1839, 2006 |
