화학공학소재연구정보센터
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No. Article
1 High quality relaxed Ge layers grown directly on a Si(001) substrate
Shah VA, Dobbie A, Myronov M, Leadley DR
Solid-State Electronics, 62(1), 189, 2011
2 A quantitative model for the interpretation of RAV (rocking curve azimuthal variation) results from heteroepitaxial semiconductor layers
Yarlagadda B, Rodriguez A, Li P, Velampati R, Ocampo JF, Ayers JE, Jain FC
Journal of Crystal Growth, 312(7), 886, 2010
3 Selective electrochemical profiling of threading defects in mismatched heteroepitaxial systems
Nemcsics A, Riesz F, Dobos L
Thin Solid Films, 343-344, 520, 1999
4 Lattice curvature of InxGa1-xAs/GaAs [001] graded buffer layers
Romanato F, Natali M, Napolitani E, Drigo AV, Bosacchi A, Ferrari C, Franchi S, Salviati G
Journal of Vacuum Science & Technology A, 16(6), 3578, 1998
5 Influence of Strain on Semiconductor Thin-Film Epitaxy
Fitzgerald EA, Samavedam SB, Xie YH, Giovane LM
Journal of Vacuum Science & Technology A, 15(3), 1048, 1997
6 Line, Point and Surface Defect Morphology of Graded, Relaxed Gesi Alloys on Si Substrates
Fitzgerald EA, Samavedam SB
Thin Solid Films, 294(1-2), 3, 1997
7 Defect-Free Strain Relaxation in Locally MBE-Grown SiGe Heterostructures
Rupp T, Kaesen F, Hansch W, Hammerl E, Gravesteijn DJ, Schorer R, Silveira E, Abstreiter G, Eisele I
Thin Solid Films, 294(1-2), 27, 1997