화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Tetrasilane and digermane for the ultra-high vacuum chemical vapor deposition of SiGe alloys
Hart J, Hazbun R, Eldridge D, Hickey R, Fernando N, Adam T, Zollner S, Kolodzey J
Thin Solid Films, 604, 23, 2016
2 Amorphous inclusions during Ge and GeSn epitaxial growth via chemical vapor deposition
Gencarelli F, Shimura Y, Kumar A, Vincent B, Moussa A, Vanhaeren D, Richard O, Bender H, Vandervorst W, Caymax M, Loo R, Heyns M
Thin Solid Films, 590, 163, 2015
3 Low-temperature Ge and GeSn Chemical Vapor Deposition using Ge2H6
Gencarelli F, Vincent B, Souriau L, Richard O, Vandervorst W, Loo R, Caymax M, Heyns M
Thin Solid Films, 520(8), 3211, 2012
4 Evidence for a retro-Diels-Alder reaction on a single crystalline surface : Butadienes on Ge(100)
Teplyakov AV, Lal P, Noah YA, Bent SF
Journal of the American Chemical Society, 120(29), 7377, 1998
5 The prototype Ge-H insertion reaction of germylene with germane. Absolute rate constants, temperature dependence, RRKM modeling and the potential energy surface
Becerra R, Boganov SE, Egorov MP, Faustov VI, Nefedov OM, Walsh R
Journal of the American Chemical Society, 120(48), 12657, 1998