검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Chemical topography analyses of silicon gates etched in HBr/Cl-2/O-2 and HBr/Cl-2/O-2/CF4 high density plasmas Vallier L, Foucher J, Detter X, Pargon E, Joubert O, Cunge G, Lill T Journal of Vacuum Science & Technology B, 21(2), 904, 2003 |
| 2 |
Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas Detter X, Palla R, Thomas-Boutherin I, Pargon E, Cunge G, Joubert O, Vallier L Journal of Vacuum Science & Technology B, 21(5), 2174, 2003 |