1 |
Sputter deposition of copper oxide films Dulmaa A, Vrielinck H, Khelifi S, Depla D Applied Surface Science, 492, 711, 2019 |
2 |
The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films Xia JJ, Liang WP, Miao Q, Depla D Applied Surface Science, 439, 545, 2018 |
3 |
Structural evolution and growth mechanisms of RF-magnetron sputter-deposited hydroxyapatite thin films on the basis of unified principles Ivanova AA, Surmeneva MA, Surmenev RA, Depla D Applied Surface Science, 425, 497, 2017 |
4 |
Quantitative correlation between intrinsic stress and microstructure of thin films Depla D, Braeckman BR Thin Solid Films, 604, 90, 2016 |
5 |
The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films Braeckman BR, Misjak F, Radnoczi G, Depla D Thin Solid Films, 616, 703, 2016 |
6 |
Modeling target erosion during reactive sputtering Strijckmans K, Depla D Applied Surface Science, 331, 185, 2015 |
7 |
On the target surface cleanness during magnetron sputtering Schelfhout R, Strijckmans K, Boydens F, Depla D Applied Surface Science, 355, 743, 2015 |
8 |
Hydrogenated Dimer Acid as a Corrosion Inhibitor for Lead Metal Substrates in Acetic Acid De Keersmaecker M, van den Berg O, Verbeken K, Depla D, Adriaens A Journal of the Electrochemical Society, 162(4), C167, 2015 |
9 |
Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films Ivanova AA, Surmeneva MA, Surmenev RA, Depla D Thin Solid Films, 591, 368, 2015 |
10 |
Electrochemical and Surface Study of Neutralized Dodecanoic Acid on a Lead Substrate De Keersmaecker M, Depla D, Verbeken K, Adriaensa A Journal of the Electrochemical Society, 161(3), C126, 2014 |