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| No. | Article |
|---|---|
| 1 |
Morphological evolution of III-V semiconductors and SiO2 during low energy electron enhanced dry etching Lee SH, Ho RM, Goorsky MS, Gillis HP, Margolese DI, Demine MA, Anz SJ Journal of Vacuum Science & Technology A, 22(4), 1600, 2004 |