검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor Degai M, Kanomata K, Momiyama K, Kubota S, Hirahara K, Hirose F Thin Solid Films, 525, 73, 2012 |
| No. | Article |
|---|---|
| 1 |
Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor Degai M, Kanomata K, Momiyama K, Kubota S, Hirahara K, Hirose F Thin Solid Films, 525, 73, 2012 |