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| No. | Article |
|---|---|
| 1 |
Ultraclean two-stage aerosol reactor for production of oxide-passivated silicon nanoparticles for novel memory devices Ostraat ML, De Blauwe JW, Green ML, Bell LD, Atwater HA, Flagan RC Journal of the Electrochemical Society, 148(5), G265, 2001 |