검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
A diode laser and modeling study of mixed (CH4-H-2-O-2) AC plasmas Fan WY, Knewstubb PF, Kaning M, Mechold L, Ropcke J, Davies PB Journal of Physical Chemistry A, 103(20), 4118, 1999 |
| 2 |
A direct approach for evaluating the thermal condition of a silicon substrate under infrared rays and specular reflectors Habuka H, Otsuka T, Mayusumi M, Shimada M, Okuyama K Journal of the Electrochemical Society, 146(2), 713, 1999 |
| 3 |
Fluid simulation of a pulsed-power inductively coupled argon plasma Lymberopoulos DP, Kolobov VI, Economou DJ Journal of Vacuum Science & Technology A, 16(2), 564, 1998 |
| 4 |
Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon Hasunuma E, Sugahara S, Hoshino S, Imai S, Ikeda K, Matsumura M Journal of Vacuum Science & Technology A, 16(2), 679, 1998 |
| 5 |
Endpoint uniformity sensing and analysis in silicon dioxide plasma etching using in situ mass spectrometry Chambers JJ, Min K, Parsons GN Journal of Vacuum Science & Technology B, 16(6), 2996, 1998 |
| 6 |
Low temperature diamond growth using halogenated hydrocarbons Schmidt I, Hentschel F, Benndorf C Solid State Ionics, 101-103, 97, 1997 |
| 7 |
The Hydrogen Reduction of Wf6 - A Kinetic-Study Based on in-Situ Partial-Pressure Measurements Oosterlaken TG, Leusink GJ, Janssen GC, Radelaar S Journal of the Electrochemical Society, 143(5), 1668, 1996 |
| 8 |
Silicon Deposition from Silane or Disilane in a Fluidized-Bed .2. Theoretical-Analysis and Modeling Caussat B, Hemati M, Couderc JP Chemical Engineering Science, 50(22), 3625, 1995 |